https://scholars.lib.ntu.edu.tw/handle/123456789/425315
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin G.-W. | en_US |
dc.contributor.author | Jiang Y.-H. | en_US |
dc.contributor.author | Kao P.-K. | en_US |
dc.contributor.author | Chiu I.-C. | en_US |
dc.contributor.author | Wu Y.-H. | en_US |
dc.contributor.author | Hsu C.-C. | en_US |
dc.contributor.author | Cheng I.-C. | en_US |
dc.contributor.author | I-CHUN CHENG | en_US |
dc.contributor.author | JIAN-ZHANG CHEN | en_US |
dc.creator | Chen J.-Z.;Cheng I.-C.;Hsu C.-C.;Wu Y.-H.;Chiu I.-C.;Kao P.-K.;Jiang Y.-H.;Lin G.-W.;JIAN-ZHANG CHEN | - |
dc.date.accessioned | 2019-09-26T07:09:41Z | - |
dc.date.available | 2019-09-26T07:09:41Z | - |
dc.date.issued | 2015 | - |
dc.identifier.issn | 20531591 | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/425315 | - |
dc.description.abstract | Weinvestigated the oxidation of sputtered metallic Sn thin films annealed byN 2 atmospheric pressure plasma jets (APPJs) with and without the introduction of ambient air to the reaction. As the APPJ annealing duration increased, the metallic Sn first oxidized into SnO, and then, a metallic Sn phase reappeared owing to the disproportionation reaction 4Sn¡÷Sn 3 O 4 +Sn¡÷2Sn + 2SnO 2 . The involvement ofO2 from the ambient air led to more reactive oxidation of the thin films. APPJ annealing increased the band gap to?2.6-2.7 eV. All the annealed films show conductivity with unstable readings of carrier types because of the mixed phases of Sn, SnO, and possibly, some SnO 2 in the films. ? 2015 IOP Publishing Ltd. | - |
dc.language | English | - |
dc.relation.ispartof | Materials Research Express | - |
dc.subject | Atmospheric pressure plasma jet | - |
dc.subject | Oxidation | - |
dc.subject | Sn | - |
dc.title | Oxidation of sputtered metallic Sn thin films using N 2 atmospheric pressure plasma jets | en_US |
dc.type | journal article | en |
dc.identifier.doi | 10.1088/2053-1591/2/1/016504 | - |
dc.identifier.scopus | 2-s2.0-84930623565 | - |
dc.identifier.url | https://www2.scopus.com/inward/record.uri?eid=2-s2.0-84930623565&doi=10.1088%2f2053-1591%2f2%2f1%2f016504&partnerID=40&md5=64949419ec9a734971f6ade6a0e1df08 | - |
dc.relation.pages | - | - |
dc.relation.journalvolume | 2 | - |
dc.relation.journalissue | 1 | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | journal article | - |
item.grantfulltext | none | - |
item.cerifentitytype | Publications | - |
item.fulltext | no fulltext | - |
crisitem.author.dept | Chemical Engineering | - |
crisitem.author.dept | Photonics and Optoelectronics | - |
crisitem.author.dept | Electrical Engineering | - |
crisitem.author.dept | Applied Mechanics | - |
crisitem.author.orcid | 0000-0002-8366-3592 | - |
crisitem.author.orcid | 0000-0003-2209-3298 | - |
crisitem.author.orcid | 0000-0002-1071-2234 | - |
crisitem.author.parentorg | College of Engineering | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Engineering | - |
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