https://scholars.lib.ntu.edu.tw/handle/123456789/432412
Title: | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing | Authors: | Shih H.-Y. Lee W.-H. Kao W.-C. Chuang Y.-C. Lin R.-M. Lin H.-C. Shiojiri M. HSIN-CHIH LIN MIIN-JANG CHEN |
Issue Date: | 2017 | Publisher: | Nature Publishing Group | Journal Volume: | 7 | Source: | Scientific Reports | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85007545369&doi=10.1038%2fsrep39717&partnerID=40&md5=771bf2c92837503da94bfc8df0a098ed https://scholars.lib.ntu.edu.tw/handle/123456789/432412 |
ISSN: | 20452322 | DOI: | 10.1038/srep39717 |
Appears in Collections: | 材料科學與工程學系 |
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