https://scholars.lib.ntu.edu.tw/handle/123456789/432414
Title: | Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure | Authors: | Wang W.-C. Tsai M.-C. Lin Y.-P. Tsai Y.-J. Lin H.-C. HSIN-CHIH LIN MIIN-JANG CHEN |
Issue Date: | 2016 | Publisher: | Elsevier Ltd | Journal Volume: | 184 | Start page/Pages: | 291-297 | Source: | Materials Chemistry and Physics | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84992754203&doi=10.1016%2fj.matchemphys.2016.09.054&partnerID=40&md5=846d5f77d905447fcbfa6a98581b0786 https://scholars.lib.ntu.edu.tw/handle/123456789/432414 |
ISSN: | 02540584 | DOI: | 10.1016/j.matchemphys.2016.09.054 |
Appears in Collections: | 材料科學與工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.