https://scholars.lib.ntu.edu.tw/handle/123456789/432414
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang W.-C. | en_US |
dc.contributor.author | Tsai M.-C. | en_US |
dc.contributor.author | Lin Y.-P. | en_US |
dc.contributor.author | Tsai Y.-J. | en_US |
dc.contributor.author | Lin H.-C. | en_US |
dc.contributor.author | HSIN-CHIH LIN | en_US |
dc.contributor.author | MIIN-JANG CHEN | en_US |
dc.creator | HSIN-CHIH LIN;Chen M.-J.;Lin H.-C.;Tsai Y.-J.;Lin Y.-P.;Tsai M.-C.;Wang W.-C. | - |
dc.date.accessioned | 2019-11-27T01:34:48Z | - |
dc.date.available | 2019-11-27T01:34:48Z | - |
dc.date.issued | 2016 | - |
dc.identifier.issn | 02540584 | - |
dc.identifier.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84992754203&doi=10.1016%2fj.matchemphys.2016.09.054&partnerID=40&md5=846d5f77d905447fcbfa6a98581b0786 | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/432414 | - |
dc.publisher | Elsevier Ltd | - |
dc.relation.ispartof | Materials Chemistry and Physics | - |
dc.title | Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure | en_US |
dc.type | journal article | en |
dc.identifier.doi | 10.1016/j.matchemphys.2016.09.054 | - |
dc.identifier.scopus | 2-s2.0-84992754203 | - |
dc.relation.pages | 291-297 | - |
dc.relation.journalvolume | 184 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.cerifentitytype | Publications | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.parentorg | College of Engineering | - |
crisitem.author.parentorg | College of Engineering | - |
顯示於: | 材料科學與工程學系 |
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