Effects of pre-sputtered Al interlayer on the atomic layer deposition of Al 2 O 3 films on Mg-10Li-0.5Zn alloy
Journal
Applied Surface Science
Journal Volume
270
Pages
452-456
Date Issued
2013
Author(s)
Abstract
In this study, a dual-layer of Al/Al 2 O 3 films was deposited on the Mg-10Li-0.5Zn substrate using both techniques of magnetron sputtering and atomic layer deposition (ALD). The pre-sputtered Al interlayer has a crystalline structure and the ALD-Al 2 O 3 film is amorphous. The Al interlayer could effectively obstruct the diffusion out of Li atoms from the Mg-10Li-0.5Zn substrate during the deposition of ALD-Al 2 O 3 film. The Mg-10Li-0.5Zn specimen with a dual-layer of Al/Al 2 O 3 films exhibits a much better corrosion resistance than those specimens with a single layer of sputtered Al or ALD-Al 2 O 3 . © 2013 Elsevier B.V.
Publisher
Elsevier B.V.
Type
journal article