Structural and electrical characteristics of atomic layer deposited high 庥 HfO2on GaN

Journal

Applied Physics Letters

Journal Volume

90

Journal Issue

23

Date Issued

2007

Author(s)

Chang, Y.C.

Chiu, H.C.

Lee, Y.J.

Huang, M.L.

Lee, K.Y.

Chiu, Y.N.

Kwo, J.

Wang, Y.H.

DOI

10.1063/1.2746057

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443437

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-34250703717&doi=10.1063%2f1.2746057&partnerID=40&md5=7dd9a84404ef3b7011f73a5e887c7943

Type

journal article