https://scholars.lib.ntu.edu.tw/handle/123456789/443447
Title: | Effect of Al incorporation in the thermal stability of atomic-layer- deposited HfO<inf>2</inf> for gate dielectric applications | Authors: | Chiou, Y.-K. Chang, C.-H. Wang, C.-C. Lee, K.-Y. Wu, T.-B. Kwo, R. Hong, M. MINGHWEI HONG |
Issue Date: | 2007 | Journal Volume: | 154 | Journal Issue: | 4 | Start page/Pages: | G99-G102 | Source: | Journal of the Electrochemical Society | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443447 | DOI: | 10.1149/1.2472562 |
Appears in Collections: | 物理學系 |
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