MBE-grown high 庥 gate dielectrics of HfO 2 and (Hf-Al)O 2 for Si and III-V semiconductors nano-electronics
Journal
Journal of Crystal Growth
Journal Volume
278
Pages
619-623
ISBN
10.1016/j.jcrysgro.2004.12.127
Date Issued
2005
Author(s)
Lee, W.C.
Lee, Y.J.
Wu, Y.D.
Chang, P.
Huang, Y.L.
Hsu, Y.L.
Mannaerts, J.P.
Lo, R.L.
Chen, F.R.
Maikap, S.
Lee, L.S.
Hsieh, W.Y.
Tsai, M.J.
Lin, S.Y.
Gustffson, T.
Kwo, J.
Type
conference paper