https://scholars.lib.ntu.edu.tw/handle/123456789/443539
Title: | Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects | Authors: | Pierreux, D. Stesmans, A. Jaccodine, R. J. Lin, M. T. Delph, T. J. MINN-TSONG LIN |
Issue Date: | 2004 | Journal Volume: | 72 | Start page/Pages: | 76-80 | Source: | Microelectronic Engineering | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443539 | ISSN: | 0167-9317 | DOI: | 10.1016/j.mee.2003.12.019 |
Appears in Collections: | 物理學系 |
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