https://scholars.lib.ntu.edu.tw/handle/123456789/443540
Title: | Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects | Authors: | Stesmans, A. Pierreux, D. Jaccodine, R. J. Lin, M. T. Delph, T. J. MINN-TSONG LIN |
Issue Date: | 2003 | Journal Volume: | 82 | Journal Issue: | 18 | Start page/Pages: | 3038-3040 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443540 | ISSN: | 0003-6951 | DOI: | 10.1063/1.1555277 |
Appears in Collections: | 物理學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.