https://scholars.lib.ntu.edu.tw/handle/123456789/497739
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tian, W.-C. | en_US |
dc.contributor.author | Weigold, J.W. | en_US |
dc.contributor.author | Pang, S.W. | en_US |
dc.contributor.author | WEI-CHENG TIAN | zz |
dc.creator | Tian, W.-C.;Weigold, J.W.;Pang, S.W. | - |
dc.date.accessioned | 2020-06-11T06:09:58Z | - |
dc.date.available | 2020-06-11T06:09:58Z | - |
dc.date.issued | 2000 | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/497739 | - |
dc.relation.ispartof | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | - |
dc.title | Comparison of Cl<inf>2</inf>and F-based dry etching for high aspect ratio Si microstructures etched with an inductively coupled plasma source | en_US |
dc.type | journal article | en |
dc.identifier.scopus | 2-s2.0-23044522692 | - |
dc.identifier.url | https://www.scopus.com/inward/record.uri?eid=2-s2.0-23044522692&partnerID=40&md5=566f90de77c00f76ac61894ce5662a7b | - |
dc.relation.pages | 1890-1896 | - |
dc.relation.journalvolume | 18 | - |
dc.relation.journalissue | 4 | - |
item.grantfulltext | none | - |
item.fulltext | no fulltext | - |
item.openairetype | journal article | - |
item.cerifentitytype | Publications | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
顯示於: | 電機工程學系 |
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