https://scholars.lib.ntu.edu.tw/handle/123456789/503913
Title: | Effect of Dilution Gas on SiCN Films Growth Using Methylamine | Authors: | J.-J. Wu K. H. Chen C. Y. Wen L. C. Chen Y. C. Yu C. W. Wang E. K. Lin |
Issue Date: | 2001 | Publisher: | Elsevier B.V. | Journal Volume: | 72 | Journal Issue: | 2 | Start page/Pages: | 240-244 | Source: | Materials Chemistry and Physics | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/503913 | ISSN: | 02540584 | DOI: | https://doi.org/10.1016/S0254-0584(01)00445-X |
Appears in Collections: | 凝態科學研究中心 |
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