Formation of High Density ?111? Textured Nanotwins in Evaporated Ag Thin Films Through Post-Deposition Ion Bombardment
Journal
IEEE Transactions on Components, Packaging and Manufacturing Technology
Journal Volume
12
Journal Issue
1
Pages
37-41
Date Issued
2022
Author(s)
Abstract
For the production of Ag thin films containing a high density of nanotwins, evaporated Ag films were bombarded with an Ar+ ion beam with voltage of about 0.1 KeV. After the post-evaporation ion bombardment for 15 min, the equiaxial coarse grains in the surface region of the originally as-evaporated Ag films transformed into slender nanotwinned columns containing a highly $\langle 111\rangle $ textured nanotwinned structure with very thin twin spacing of about 8.6 nm. The nanotwinned columns increased with extension of the ion bombardment time to 30 min. The appearance of (111)-oriented fine grains in top-view electron backscatter diffraction (EBSD) images confirmed the high density of Ag nanotwins. Meanwhile, the roughness of the thin films increased after ion bombardment of the evaporated Ag films. Finally, a mechanism of nanotwin formation based on stress relaxation in evaporated Ag films through post-deposition ion bombardment is proposed. ? 2011-2012 IEEE.
Subjects
Ag nanotwin
equiaxial coarse grains
post-deposition ion bombardment
Deposition
Ion beams
Ion bombardment
Silicon
Stress relaxation
Substrates
Textures
Thin films
Ag films
Coarse grains
Equiaxial coarse grain
Ions bombardment
Nanotwinned
Nanotwins
Post-deposition
Post-deposition ion bombardment
Rough surfaces
Surface roughness
Type
journal article