Density dependence of the excitation gaps in an undoped Si/SiGe double-quantum-well heterostructure
Journal
Applied Physics Letters
Journal Volume
119
Journal Issue
22
Date Issued
2021
Author(s)
Abstract
We report low-temperature magneto-transport measurements of an undoped Si/SiGe asymmetric double quantum well heterostructure. The density in both layers is tuned independently utilizing top and bottom gates, allowing the investigation of quantum wells at both imbalanced and matched densities. Integer quantum Hall states at total filling factor ν T = 1 and ν T = 2 are observed in both density regimes, and the evolution of their excitation gaps is reported as a function of the density. The ν T = 1 gap evolution departs from the behavior generally observed for valley splitting in the single layer regime. Furthermore, by comparing the ν T = 2 gap to the single particle tunneling energy, Δ SAS, obtained from Schr?dinger-Poisson (SP) simulations, evidence for the onset of spontaneous interlayer coherence is observed for a relative filling fraction imbalance smaller than ? 50 %. ? 2021 Author(s).
Subjects
Quantum chemistry
Quantum theory
Silicon
Temperature
Asymmetric double quantum wells
Bottom gate
Density dependence
Double quantum well heterostructures
Excitation gaps
Lows-temperatures
Magneto-transport measurement
Measurements of
Si/SiGe
Top gate
Semiconductor quantum wells
Type
journal article