https://scholars.lib.ntu.edu.tw/handle/123456789/61404
標題: | A pplication of soft landing to the process control of chemical mechanical polishing | 作者: | Chiu, Jian-Bin Yu, Cheng-Ching Shen, Shih-Haur |
關鍵字: | soft landing;minimum time problem;chemical mechanical polishing;damascene;STI process control | 公開日期: | 2003 | 出版社: | Taipei:National Taiwan University Dept Chem Engn | 起(迄)頁: | - | 來源出版物: | Microelectronic Engineering 65(2003), 345–356 | 摘要: | In chemical mechanical polishing (CMP), a two-stage polishing strategy is often employed. A high removal rate (RR) is set at the initial stage, then a lower RR is employed to remove residual metal and extended to the over-polish stage. An analogy between the soft landing of a spacecraft and CMP operation is established and the CMP operation can be viewed as a minimum-time optimal control problem. Measurement uncertainties prevent direct implementation of bang-bang control law for the entire polishing process. Thus, a two-stage CMP operation procedure is devised to ensure robust operation while maintaining a high throughput. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/2006111501244184 | 其他識別: | 246246/2006111501244184 |
顯示於: | 化學工程學系 |
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