A circular micromirror array fabricated by a maskless post-CMOS process
Resource
Microsystem Technologies 11: 444-451
Journal
Microsystem Technologies
Journal Volume
11
Journal Issue
6
Pages
444-451
Date Issued
2005
Date
2005
Author(s)
Abstract
This work studies the fabrication of a circular micromirror array by the standard 0.35 μm SPFM (Single Polysilicon Four Metals) CMOS (complementary metal oxide semiconductor) process and a maskless postprocess. The advantages of the post-process are its compatibility with conventional CMOS process and this method provides a way to designer to quickly construct micromachined structures using the standardized procedures. The mentioned circular micromirror array that contains 10 × 10 micromirror switches is integrated with a 1 × 8 de-multiplexer control circuit and a four-stage charge pump on a chip. The radius of each micromirror is about 25 ìm, and the gap from the bottom electrode to the top mirror plate is about 5 μm. The micromirror array is actuated using an electrostatic force. Simulated results show that the micromirror has a tilting angle of around 9° at a driving voltage of 30 V. The root-mean-square roughness and the average roughness of the mirror surface are measured at 15.31 nm and 12.58 nm respectively. In addition, the first and the second mode of natural frequency of the micromirror switch are around 492 KHz and 508 KHz, respectively. © Springer-Verlag Berlin Heidelberg 2005.
Type
journal article
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