dc.relation.reference | Chap. 1
[1] 陳釧鋒, “奈米轉印製程與設備技術發展現況介紹”, 機械工業雜誌, 255期, 151-162頁
[2] C. A. Mack, “Pitch: The Other Resolution,” Microlithography World (Summer 1998), pp. 23-24.
[3] 廖明吉, “微米世代的微影解決方法”, 奈米通訊, 第五卷第四期
[4] C. A. Mack, “Depth of Focus,” Microlithography World (Spring 1995), pp. 20-21.
[5] http://www.techreview.com/gen_info/pr010803.asp
[6] T. W. Ebbesen, et al., “Extraordinary Optical Transmission through Subwavelength Hole Arrays”, Nature, 391, 667, 1998.
[7] H. J. Lezec, et al, “Beaming Light from a Subwavelength Aperture”, Science, 297, 820, 2002.
Chap. 2
[8] H. A. Bethe, “Theory of Diffraction by Small Holes”, Physical Review, Vol. 66, pp. 163-182, October 1, 1944.
[9] J. A. Porto, F. J. Garcia-Vidal, J. B. Pendry, “Transmission Resonances on Metallic Gratings with Very Narrow Slits”, Phys. Rev. Lett., 83, 14, 2845, 1999.
[10] H. J. Lezec, et al, “Beaming Light from a Subwavelength Aperture”, Science, 297, 820, 2002.
[11] Tineko Thio, H J Lezec, et al., “Giant Optical Transmission of Sub-wavelength Apertures: Physics and Applications”, Nanotechnology, 13, 429, 2002.
[12] L. Martin-Moreno, F. J. Garcia-Vidal, et al., “Theory of Highly Directional Emission from a Single Subwavelength Aperture Surrounded by Surface Corrugations”, Phys. Rev. Lett., 90, 16, 167401, 2003.
[13] F. J. Garcia-Vidal, H. J. Lezec, et al., “Multiple Paths to Enhance Optical Transmission through a Single Subwavelength Slit”, Phys. Rev. Lett., 90, 21, 213901, 2003.
[14] William L. Barnes, et al., “Surface plasmon subwavelength optics”, Nature, 424, 824, 2003.
[15] F. J. Garcia-Vidal, L. Martin-Moreno, “Transmission and Focusing of Light in One-dimensional Periodically Nanostructured Metals”, Phys. Rev. B. 66, 155412, 2002.
[16] W. l. Barnes, W. A. Murray, et al., “Surface Plamon Polaritons and Their Role in the Enhanced Transmission of Light through Periodic Arrays of Subwavelength Holes in a Metal Film”, Phys. Rev. Lett. 92, 10, 107401, 2004.
[17] 陳怡君, 介電奈米表面結構與金屬材料之互動所引致指向性出射研究: 奈米直寫儀光學頭之創新設計, 國立台灣大學應用力學所碩士論文, 2004.
[18] 楊東霖, 金屬奈米表面介電奈米結構耦合表面電漿子之互動研究: 奈米直寫儀次波長介電光學頭之模擬與研製, 國立台灣大學應用力學所碩士論文, 2005.
[19] S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of Sub-25 nm Vias and Trenches in Polymers”, Applied Physics Letters, Vol. 67 (21), pp. 3114-3116, November 20, 1995.
[20] S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint Lithography with 25-nanometer Resolution”, Science, Vol. 272, pp. 85-87, April 5, 1996.
[21] Komuro, “Imprint Characteristric by Photo-Induced Solidification of Liquid Polymer”,
[22] “Lithography”, The International Technology Roadmap for Semiconductors 2003 Edition.
[23] S. Y. Chou, and C. Keimel, J. Gu, “Ultrafast and Direct Imprint of Nanostructures in Silicon,” Nature, Vol. 417, pp. 835-837, June 20, 200
[24] Zhaoning Yu, and S. Y. Chou, “Fabrication of Large Area Subwavelength Antireflection Liftoff”, J. Vac. Sci Technol B, 21 (6), 2874-2877, Nov/Dec 2003.
[25] Zhaoning Yu, and S. Y. Chou, “Triangular Profile Imprint Molds in Nanograting Fabrication”, NANO LETTERS, Vol.4, No.2, 341-344, 2004.
[26] Michael D. Austin, and S. Y. Chou, “Fabrication of 5nm Linewidth and 14nm Pitch Features by Nanoimprint Lithography”, Applied Physics Letters, Vol. 84 (26), pp. 5299-5301, June 28, 2004.
[27] L. Guo, P. R. Krauss, and S. Y. Chou, “Nanoscale Silicon Field Effect Transistors Fabricated Using Imprint Lithography”, Applied Physics Letters, Vol. 71, pp. 1881-1883, September 29, 1997.
[28] P. R. Krauss, and S. Y. Chou, “Nano-compact Disks with 400 Gbit/in2 Storage Density Fabricated Using Nanoimprint Lithography and Read with Proximal Probe”, Applied Physics Letters, Vol. 71, pp. 3174-3176, November 24, 1997.
[29] H. Tan, A. Gilbertson, and S. Y. Chou, “Roller Nanoimprint Lithography”, Journal of Vacuum Society and Technology B, Vol. 16, pp. 3926-3928, 1998.
[30] Z. Yu, S. J. Schablitsky, and S. Y. Chou, “Nanoscale GaAs Metal–Semiconductor–Metal Photodetectors Fabricated Using Nanoimprint Lithography”, Applied Physics Letters, Vol. 74, pp. 2381-2383, April 19, 1999.
[31] J. Wang, X. Sun, L. Chen, and S. Y. Chou, “Direct Nanoimprint of Submicron Organic Light-Emitting Structures”, Applied Physics Letters, Vol. 75, pp. 2767-2769, November 1, 1999.
[32] M. Li, J. Wang, L. Zhuang, and S. Y. Chou, “Fabrication of Circular Optical Structures with a 20nm Minimum Feature Size Using Nanoimprint Lithography”, Applied Physics Letters, Vol. 76, pp. 673-675, February 7, 2000.
[33] J. Wang, X. Sun, L. Chen, L. Zhuang, and S. Y. Chou, “Molecular Alignment in Submicron Patterned Polymer Matrix Using Nanoimprint Lithography”, Applied Physics Letters, Vol. 77, pp. 166-168, July 10, 2000.
[34] I. Puscasu, D. Boreman, R. C. Tiberio, D. Spencer, and R. R. Krchnavek, “Comparison of Infrared Frequency Selective Surfaces Fabricated by Direct-write Electron-beam and Bilayer Nanoimprint Lithographies”, Journal of Vacuum Society and Technology B, Vol. 18, pp. 3578-3581, 2000.
[35] W. Zhang, and S. Y. Chou, “Multilevel Nanoimprint Lithography with Submicron Alignment over 4 in. Si Wafers”, Applied Physics Letters, Vol. 79, pp. 845-847, August 6, 2001.
[36] C. M. Park, B. H. Choi, C. K. Hyon, S. W. Hwang, D. Ahn, and E. K. Kim, “Nano Mold Lithography for 40-nm Patterns”, Journal of the Korean Physical Society, Vol. 39, pp. 157-159, 2001.
[37] N. Roos, T. Luxbacher, T. Glinsner, K. Pfeiffer, H. Schulz, and Hella-C. Scheer, “Nanoimprint Lithography with a Commercial 4 inch Bond System for Hot Embossing”, Proceedings of SPIE, Vol. 4343, pp. 427-435, 2001.
[38] O. Bobenstetter, T. Glinsner, P. Lindner, and N. Roos, “Nanoimprinting by Using a State of the Art 40kN Hot Embosser”, Micro and Nano-Engineering (MNE) 2001, Grenoble, France, September 16-19, 2001.
Chap. 3
[39] 林鼎晸,用於奈米雷射直寫儀之浪型次波長結構之模擬與研製,國立台灣大學應用力學研究所碩士論文,2003.
[40] ELS-7500EX TFE Electron Beam Lithography System Instruction Manual, ELIONIX Inc.
[41] 莊達人, VLSI製造技術 -五版修訂, 高立圖書有限公司, ISBN : 957-584-985-X, 2002.
[42] E. Qu´evy, B. Parvais, J. PRaskin, L. Buchaillot, D. Flandre, and D. Collard, “A modified Bosch-type Process for Precise Surface Micromachining of Polysilicon”, Journal of Micromechanics and Microengineering, Vol. 12, pp. 328-333, 2002.
[43] F. Laermer, and A. Schilp, “Method for Anisotropic Plasma Etching of Substrates,” US Patent No 5498312, March 12, 1996.
[44] 微機電系統技術與應用, 行政院國家科學委員會精密儀器發展中心出版
[45] 王湧鋒, 奈米直寫儀光學頭之奈米壓印製作方法的先導性研究, 國立台灣大學應用力學所碩士論文, 2004. | zh_TW |