https://scholars.lib.ntu.edu.tw/handle/123456789/73440
Title: | Band offsets and charge storage characteristics of atomic layer deposited high-k HfO2/TiO2 multilayers | Authors: | Maikap, S. Wang, T.Y. Tzeng, P.J. Lin, C.H. Tien, T. C. Lee, L. S. Yang, J. R. Tsai, M.J. |
Issue Date: | 2007 | Journal Volume: | 90 | Journal Issue: | 262901 | Start page/Pages: | - | Source: | Applied Physics Letters | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/93245 |
Appears in Collections: | 材料科學與工程學系 |
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