https://scholars.lib.ntu.edu.tw/handle/123456789/73442
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Maikap, S. | en |
dc.contributor.author | Tzeng, P. J. | en |
dc.contributor.author | Wang, T. Y. | en |
dc.contributor.author | Lee, H. Y. | en |
dc.contributor.author | Lin, C. H. | en |
dc.contributor.author | Wang,? C. C. | en |
dc.contributor.author | Lee, L. S. | en |
dc.contributor.author | Yang, J. R. | en |
dc.contributor.author | Tsai, M. J. | en |
dc.creator | Maikap, S.; Tzeng, P. J.; Wang, T. Y.; Lee, H. Y.; Lin, C. H.; Wang,? C. C.; Lee, L. S.; Yang, J. R.; Tsai, M. J. | en |
dc.date | 2007 | en |
dc.date.accessioned | 2008-12-24T02:24:52Z | - |
dc.date.accessioned | 2018-06-28T21:41:02Z | - |
dc.date.available | 2008-12-24T02:24:52Z | - |
dc.date.available | 2018-06-28T21:41:02Z | - |
dc.date.issued | 2007 | - |
dc.identifier.uri | http://ntur.lib.ntu.edu.tw//handle/246246/93247 | - |
dc.format | application/pdf | en |
dc.format.extent | 201316 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.language | en | en |
dc.language.iso | en_US | - |
dc.relation | Japanese Journal of Applied Physics 45: 1803-1807 | en |
dc.relation.ispartof | Japanese Journal of Applied | - |
dc.title | HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications | en |
dc.type | journal article | en |
dc.relation.pages | Physic-s | - |
dc.identifier.uri.fulltext | http://ntur.lib.ntu.edu.tw/bitstream/246246/93247/1/8.pdf | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.openairetype | journal article | - |
item.languageiso639-1 | en_US | - |
item.grantfulltext | open | - |
item.cerifentitytype | Publications | - |
item.fulltext | with fulltext | - |
顯示於: | 材料科學與工程學系 |
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