https://scholars.lib.ntu.edu.tw/handle/123456789/73500
標題: | Electrodeposition of Nickel-Phosphorus Alloy from Sulfamate Baths with Improved Current Efficiency | 作者: | Lin, C. S. Lee, C. Y. Chen, F. J. Chien, C. T. Lin, P. L. Chung, W. C. LinCS |
公開日期: | 2006 | 卷: | 153 | 期: | 6 | 起(迄)頁: | - | 來源出版物: | Journal of The Electrochemical Society | 摘要: | In this study, nickel-phosphorus (Ni-P) deposits were electroplated from the nickel sulfamate bath containing phosphorous acid using a pulse current, with emphasis on the effect of current density, duty cycle, and frequency of the pulse current. Experimental results show that both the deposit phosphorus content and current efficiency were substantially enhanced by employing the pulse current, preferentially at low duty cycles. The underlying difference for the dc and pulse currents on the effect of deposit phosphorus content and current efficiency can be explained by the detailed half-reactions relevant to incorporation of phosphorus into Ni-P alloys. Less variation in surface proton, Ni2+ and H3 P O3 concentration due to the diffusion recovery during the time off of a pulse current is believed to play an important role in the improvement of the plating process. © 2006 The Electrochemical Society. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/93308 https://www.scopus.com/inward/record.uri?eid=2-s2.0-33646418704&doi=10.1149%2f1.2186798&partnerID=40&md5=efde0ebe1289792bfd0d9e5da9891e0a |
ISSN: | 00134651 |
顯示於: | 材料科學與工程學系 |
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