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  4. Applications of Advanced Lithography on Chemical Sensors and Optoelectronic Devices
 
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Applications of Advanced Lithography on Chemical Sensors and Optoelectronic Devices

Date Issued
2010
Date
2010
Author(s)
Yu, Chen-Chieh
URI
http://ntur.lib.ntu.edu.tw//handle/246246/251802
Abstract
Advanced lithography has been widely applied on the field of optoelectroincs. Because of the advantages of fast manufacturing and convenience, advanced lithography is competive againest tranditional photolithography and e-beam lithography. In this article, we successfully fabricated one-dimensional corrugated structure and two-dimensional hexagonal hole array on gold films. Because these subwavelength periodical metal structures are capable to induce surface plasmon resonance, they have the potential to be chemical sensors. We fabricate a chemical sensor based on one-dimensional corragted gold film and demonstrate that this chemical sensor possesses extremely high sensitivity. Moreover, the comparison between the chemical sensors based on one-dimensional and two dimensional strucuture is also carried out in this article. Besides, we used the dual side nanoimprint lithography to fabricate a high aspect ratio gratings strucuture on PC substrate. This subwavlength gratings structure has demonstrated the form birefringence, and thus has the potential to be optical wave plate. With contolling the filling factor and trench depth of the gratings structure, we successfully fabricate a 1/8 wave plate that works at 633nm. Moreover, with stacking numerical wave plate together, we can obtain any amount of phase retardation. This stacking-wave plate method is suitable for any working wavelength if we presicely control the trench depth of each gratings-based wave plate. In the last, we use the colloidal lithography to fabricate a transparent electrode based on metal nanomesh structure. For applying on photovoltaic devices, the nanomesh metal electrode has the advantages of highly optical transmittance and excellent conductivity. The period and diameter of the hexagonal hole array on nanomesh can be tuned by the fabricating parameters of colloidal lithography. The organic solar cells associated with the transparent nanomesh electrode demonstrate a high power conversion efficiency, and we conclude that the metal nanomesh electrode is a promising candidate for replacing traditional conductive oxide such as ITO.
Subjects
nanoimprint lithography
reversal imprint lithography
colloidal lithography
surface plasmon resonance
optical wave plate
transparent electrode
organic solar cells
SDGs

[SDGs]SDG7

Type
thesis
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