https://scholars.lib.ntu.edu.tw/handle/123456789/74996
標題: | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | 作者: | Chen, Hsuen-Li Wang, Lon A. |
公開日期: | 1999 | 卷: | 38 | 期: | 22 | 起(迄)頁: | 4885-4890 | 來源出版物: | Applied Optics | 摘要: | We demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) film, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al-Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swing effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer. © 1999 Optical Society of America. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/95607 https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032606739&doi=10.1364%2fAO.38.004885&partnerID=40&md5=440bd951abc8d9965a7e790cdd76917c |
ISSN: | 1559128X | SDG/關鍵字: | Electron cyclotron resonance; Excimer lasers; Light extinction; Light transmission; Photolithography; Plasma enhanced chemical vapor deposition; Refractive index; Silicon compounds; Bottom antireflective coatings (BARC); Hexamethyldisiloxane; Antireflection coatings |
顯示於: | 材料科學與工程學系 |
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