https://scholars.lib.ntu.edu.tw/handle/123456789/74996
Title: | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | Authors: | Chen, Hsuen-Li Wang, Lon A. |
Issue Date: | 1999 | Journal Volume: | 38 | Journal Issue: | 22 | Start page/Pages: | 4885-4890 | Source: | Applied Optics | Abstract: | We demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) film, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al-Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swing effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer. © 1999 Optical Society of America. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/95607 https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032606739&doi=10.1364%2fAO.38.004885&partnerID=40&md5=440bd951abc8d9965a7e790cdd76917c |
ISSN: | 1559128X | SDG/Keyword: | Electron cyclotron resonance; Excimer lasers; Light extinction; Light transmission; Photolithography; Plasma enhanced chemical vapor deposition; Refractive index; Silicon compounds; Bottom antireflective coatings (BARC); Hexamethyldisiloxane; Antireflection coatings |
Appears in Collections: | 材料科學與工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.