https://scholars.lib.ntu.edu.tw/handle/123456789/75760
標題: | Microstructure and properties of carbon-sulfur-containing chromium deposits electroplated in trivalent chromium baths with thiosalicylic acid | 作者: | Chien, C.W. Liu, C.L. Chen, F.J. Lin, K.H. CHAO-SUNG LIN |
公開日期: | 2012 | 期: | 72 | 起(迄)頁: | 74-80 | 來源出版物: | Electrochimica Acta | URI: | https://www2.scopus.com/record/display.uri?eid=2-s2.0-84861341360&origin=resultslist&sort=plf-f&src=s&sid=e57b26ef02be81d05df1622a947de67a&sot=b&sdt=b&s=TITLE-ABS-KEY%28Microstructure+and+properties+of+carbon-sulfur-containing+chromium+deposits+electroplated+in+trivalent+chromium+baths+with+thiosalicylic+acid%29&sl=156&sessionSearchId=e57b26ef02be81d05df1622a947de67a&relpos=0 | DOI: | 10.1016/j.electacta.2012.03.168 |
顯示於: | 材料科學與工程學系 |
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