https://scholars.lib.ntu.edu.tw/handle/123456789/75805| Title: | Resistive switching characteristics of multilayered (HfO2/Al2O3)(n) n=19 thin film | Authors: | Tzeng, Wen-Hsien Tsai, Feng-Yu et al. Liu, K.-C. Chang, K.-M. Lin, H.-C. Chan, Y.-C. Kuo, C.-C. Tsai, F.-Y. Tseng, M.H. Chen, P.-S. Lee, H.-Y. Chen, F. FENG-YU TSAI |
Issue Date: | 2012 | Start page/Pages: | 3415-3418 | Source: | Thin Solid Films | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/243621 | DOI: | 10.1016/j.tsf.2011.10.118 |
| Appears in Collections: | 材料科學與工程學系 |
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