合金薄膜形態變化之穩定分析

Abstract

本研究計劃乃探討半導體合金薄膜型態變化之穩定分析;此項研究在加強與 擴展半導體領域上是極具有發展潛力的。我們藉由發展材料多重尺度模型，來 建構本研究之理論基礎，並提出一種全新的構想，即藉由探討非均質組成濃度 和薄膜表面粗糙所造成的耦合效應，來研究合金薄膜型態變化之穩定分析。同 時結果顯示對合金薄膜生成中其奇異溫度的大小，乃是藉由不穩定因素諸如彈 性應變能，與穩定因素諸如化學能和表面張力，之間的競爭而得到。

We have studied the morphological stability of semi- conductor alloy lms with potential to enhance and enlarge the current spectrum of applications that are of interest to the semiconductor industry. We have developed a framework based on the multiscale mod- eling to perform stability analysis of alloy lm growth accounting for the joint eect of nonuniform composi- tion and surface roughness. We have shown that the critical temperature is obtained by the competition between the destabilizing in uence of elastic strain energy and the stabilizing in uence of chemical and surface energies.