Effect of Fabrication Parameters on Three-Dimensional Nanostructures of Bulk Heterojunctions Imaged by High-Resolution Scanning ToF-SIMS

Yu, Bang-YingBang-YingYuLin, Wei-ChunWei-ChunLinWang, Wei-BenWei-BenWangIida, Shin-ichiShin-ichiIidaChen, Sun-ZenSun-ZenChenLiu, Chia-YiChia-YiLiuKuo, Che-HungChe-HungKuoLee, Szu-HsianSzu-HsianLeeKao, Wei-LunWei-LunKaoYen, Guo-JiGuo-JiYenYou, Yun-WenYun-WenYouLiu, Chi-PingChi-PingLiuJou, Jwo-HueiJwo-HueiJouShyue, Jing-JongJing-JongShyue2012-10-242018-06-282012-10-242018-06-282010http://ntur.lib.ntu.edu.tw//handle/246246/243930en-USEffect of Fabrication Parameters on Three-Dimensional Nanostructures of Bulk Heterojunctions Imaged by High-Resolution Scanning ToF-SIMSjournal article10.1021/nn9014449http://ntur.lib.ntu.edu.tw/bitstream/246246/243930/-1/375.pdf