臺灣大學: 機械工程學研究所顏家鈺邱陳龑Chiu, PabloPabloChiu2013-04-012018-06-282013-04-012018-06-282010http://ntur.lib.ntu.edu.tw//handle/246246/256265電子束微影已逐漸成為次世代半導體製造之重要研發趨勢。而在使用固定電子束寫入之無光罩微影系統時，圖形接合將是個具有挑戰性的研究方向。本論文為改善電子束微影載台所造成的圖形接合之誤差，改裝了一台市售的掃描式電子顯微鏡(JEOL JSM 7000F SEM)，並在其本上的長行程載台以及試片載具之間嵌入了一個高解析度的定位平台。試片會放置在高解析度定位平台並且配合干涉儀量測系統做回饋控制。圖形接合實施在新設計的定位平台和掃描式電子顯微鏡載台的配合。高解析度定位平台是利用壓電致動器來驅動，並且補償解析度較低的載台所造成的誤差。本論文以模擬及實驗數據驗證壓電平台各軸互相的影響是微小的，而且使用PID控制器來去對付壓電的非線性與遲滯效應。掃描式電子顯微鏡本身的載台雖然解析度較低，但可達至長行程，所以圖形接合可達到毫米距離的範圍。本論文在曝寫實驗中有顯示出大面積之圖形接合的成果。Electron beam lithography has become one of the most promising candidates of next-generation lithography technologies. Then, pattern-placement inaccuracy will be a challenging research topic when maskless electron beam direct-write lithography is used. In order to correct the field-stitching errors, a high-resolution nano stage is integrated into the original stage (JEOL JSM 7000F SEM). The wafer is placed on the highly accurate laser-interferometer-controlled-stage, and patterns are written with reference mirrors on the stage. A feedback controller is used for pattern-placement. Piezoelectric actuators are used to drive the fine stage, and it compensates the insufficient resolution of the coarse stage. The piezo-stage is demonstrated to be nearly decoupled and the non-linear behavior is overcome with PID controllers. The long travel-range of the coarse stage allows us to achieve exposures of millimeter-range areas. Large displacement pattern-stitching are demonstrated in the experimental results.5304350 bytesapplication/pdfen-US電子束微影圖形接合奈米平台壓電致動器干涉儀量測系統PID控制器Electron-beam lithographypattern-stitchingnano-stagepiezoelectric transducerlaser-beam interferometer systemPID controllerthesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/256265/1/ntu-99-R97522806-1.pdf