Patterning of nanoscale Si lines using e-beam lithography and high-selectivity plasma etching

Hou, F.-J.F.-J.HouLin, H.-C.H.-C.LinChen, H.-L.H.-L.ChenLiu, J.-T.J.-T.LiuPan, C.-T.C.-T.PanKo, F.-H.F.-H.KoWang, M.-F.M.-F.WangHuang, T.-Y.T.-Y.HuangHSUEN-LI CHEN2020-05-122020-05-122002https://scholars.lib.ntu.edu.tw/handle/123456789/491390Patterning of nanoscale Si lines using e-beam lithography and high-selectivity plasma etchingconference paper10.1109/IMNC.2002.11785732-s2.0-84960406275https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960406275&doi=10.1109%2fIMNC.2002.1178573&partnerID=40&md5=a2b800d6c16abd5e5af212328a9dd1c9