Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics

Lee, K. C.K. C.Lee胡振國Hwu, Jenn-GwoJenn-GwoHwu2009-04-272018-07-062009-04-272018-07-061994http://ntur.lib.ntu.edu.tw//handle/246246/153884en-USApplication of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectricsreport