W. C. ChengF. D. LaiH. M. HuangLON A. WANG2018-09-102018-09-102004-0601679317http://scholars.lib.ntu.edu.tw/handle/123456789/310755https://www.scopus.com/inward/record.uri?eid=2-s2.0-18544403363&doi=10.1016%2fS0167-9317%2804%2900073-5&partnerID=40&md5=a84695220a1dff4f8072d2a88b8db28dWe report a novel tri-layer bottom antireflective coating (BARC) design based on hexamethyldisiloxane (HMDSO) films working simultaneously at 157, 193 and 248 nm wavelengths. The required optical constant for each layer can be tuned by varying the gas flow rate ratio of oxygen to HMDSO in an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) process. The swing effect in the resist is experimentally shown to be reduced significantly by adding this tri-layer BARC structure. © 2004 Elsevier B.V. All rights reserved.application/pdfapplication/pdfComputational methods; Computer simulation; Cyclotron resonance; Excimer lasers; Matrix algebra; Plasma enhanced chemical vapor deposition; Problem solving; Reflection; Reflective coatings; Silicon; Substrates; Thin films; Ultraviolet radiation; Bottom antireflective coating (BARC); Flow rates; Hexamethyldisiloxane (HMDSO); Tunability; Photolithographyconference paper10.1016/j.mee.2004.02.0162-s2.0-18544403363WOS:000222145400012