Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability

Hoi-Tou NgChun-Hung LiuHsing-Hong ChenKuen-Yu TsaiKUEN-YU TSAI2018-09-102018-09-102009-11http://scholars.lib.ntu.edu.tw/handle/123456789/352129Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variabilityconference paper