Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithography

Chen, H.L.H.L.ChenCheng, H.C.H.C.ChengLi, M.Y.M.Y.LiKo, F.H.F.H.KoHuang, T.Y.T.Y.HuangChu, T.C.T.C.ChuHSUEN-LI CHEN2020-05-122020-05-122002https://scholars.lib.ntu.edu.tw/handle/123456789/491380Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithographyjournal article10.1016/S0038-1101(02)00054-02-s2.0-0036680403https://www.scopus.com/inward/record.uri?eid=2-s2.0-0036680403&doi=10.1016%2fS0038-1101%2802%2900054-0&partnerID=40&md5=d56370c0cf1002bf517e51ca838422ee