A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Philip C. W. NgKuen-Yu TsaiYen-Min LeeTing-Han PeiFu-Min WangJia-Han LiKUEN-YU TSAIJIA-HAN LI2018-09-102018-09-102009-11http://scholars.lib.ntu.edu.tw/handle/123456789/352126A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windowsconference paper10.1117/12.8370772-s2.0-77952014254