2010-08-012024-05-17https://scholars.lib.ntu.edu.tw/handle/123456789/688527摘要：極紫外光微影 (Extreme Ultra-Violet Lithography, EUVL) 技術可望作為下一階段奈米製程標準；然而週邊設備的搭配卻可能成為其技術上發展的瓶頸。就解析度而言，EUVL 需達低於 3nm 的檢測能力；因而如何架構一個適當的晶圓掃瞄平台，達到 EUUL 系統的要求，就成為攸關 EUVL 系統發展成敗的關鍵因素之一。本計畫的目的，就在於製作大行程、高精密之晶圓掃瞄平台，並且配合先進控制器設計，以達到 EUVL 的精密定位要求。首先，考慮到外界擾動訊號的隔絕，吾人運用之前發展的控制理論—擾動響應分解 (Disturbance Response Decoupling, DRD)，使用半主動方式控制光學桌，使用被動式控制改善地面對機體之擾動，再搭配主動式控制改善機台本身產生之擾動，隔絕外界擾動訊號對於奈米晶圓掃瞄載台的影響。其次，考慮其解析度要求需達奈米等級，而其行程需達微米、甚至毫米範圍以製作大面積之晶片，故使用兩部精密定位平台組成伺服機構；粗調部分以移動距離較大，但解析度較差之二維移動平台達成；微調部分則以解析度較高，但移動距離較小之壓電平台達成。再則，考慮到此晶圓掃瞄平台係架構於高真空環境(子計畫四提供之真空腔)，故必須降低平台污染，及設計自動回復記錄定位之功能。最後，則以光學干涉儀(雷射干涉儀)架構三軸量測系統，以回饋位移訊號進行精密定位控制。在控制器設計方面，則考慮到壓電材料之磁滯效應等非線性因素，故配合反相操作電壓進行控制，並運用強韌控制理論設計適當的控制器，進行 EUVL 系統精密定位控制。<br> Abstract: Extreme Ultra-Violet Lithography (EUVL) is expected to provide commercial solution for manufacturing of semiconductor devices with 22nm half pitch and below. However, significant developments are still needed, especially in the system components and assembly. This project focuses on the development and control of the scanning stage for the EUVL system. First, to isolate external disturbances, Disturbance Response Decoupling (DRD) techniques are applied to a semi-active optical table to decouple the ground disturbances and the machine vibrations. Second, considering the operation range and resolution requirement, a double-layer Piezo Transducer (PZT) stage is proposed, where the bottom layer is operated in long stroke with lower resolution, while the top layer is design to move in short distance with high resolution. Moreover, low stage pollution should be achieved, because the stage is operated inside a vacuum chamber (designed by sub-project IV). Finally, a closed-loop laser positioning system is employed to feedback the position signals of the stage for controller design. Due to the nonlinearities of PZTs, such as hysteresis, robust control algorithms are applied for controller design, to satisfy the EUVL system requirements.極紫外光微影擾動響應分解強韌控系統精密定位Extreme Ultra-Violet Lithography (EUVL)Disturbance Response Decoupling (DRD)robust controlsystem precision positioning以波帶片陣列為基礎之極紫外光直寫微影系統之研發-子計畫五：極紫外光直寫微影系統之伺服控制