Interface reactions of high-k Y2O3 gate oxides with Si

Busch, BWBWBuschKwo, JJKwoMINGHWEI HONGMannaerts, JPJPMannaertsSapjeta, BJBJSapjetaSchulte, WHWHSchulteGarfunkel, EEGarfunkelGustafsson, TTGustafsson2018-09-102018-09-102001http://scholars.lib.ntu.edu.tw/handle/123456789/293165Interface reactions of high-k Y2O3 gate oxides with Sijournal article