Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation

Yeh, Kuo-LangKuo-LangYehJeng, Ming-JerMing-JerJengHwu, Jenn-GwoJenn-GwoHwuJENN-GWO HWU2018-09-102018-09-101998http://www.scopus.com/inward/record.url?eid=2-s2.0-0032115466&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/338633Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidationjournal article