Improvement in the electrical properties of thin gate oxides by chemical-assisted electron stressing followed by annealing (CAESA)

Shih, Y.-H.Y.-H.ShihHwu, J.-G.J.-G.HwuJENN-GWO HWU2018-09-102018-09-101999http://www.scopus.com/inward/record.url?eid=2-s2.0-0033221322&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/347706Improvement in the electrical properties of thin gate oxides by chemical-assisted electron stressing followed by annealing (CAESA)journal article10.1109/55.798038