600 meV Effective Work Function Tuning by Sputtered WNxFilms

Tsai, C.-E.C.-E.TsaiHuang, C.-H.C.-H.HuangChen, Y.-R.Y.-R.ChenTu, C.-T.C.-T.TuHuang, Y.-S.Y.-S.HuangLiu, C.W.C.W.LiuCHEE-WEE LIU2021-02-222021-02-222020https://www.scopus.com/inward/record.url?eid=2-s2.0-85093650712&partnerID=40&md5=5989bc76e081a70f01914b17b43b875bhttps://scholars.lib.ntu.edu.tw/handle/123456789/549180600 meV Effective Work Function Tuning by Sputtered WNxFilmsconference paper10.1109/VLSI-TSA48913.2020.92037422-s2.0-85093650712