Shiu, K.H.K.H.ShiuChiang, C.H.C.H.ChiangLee, Y.J.Y.J.LeeLee, W.C.W.C.LeeChang, P.P.ChangTung, L.T.L.T.TungMINGHWEI HONGKwo, J.J.KwoTsai, W.W.Tsai2019-12-272019-12-272008https://scholars.lib.ntu.edu.tw/handle/123456789/443422Oxide scalability in Al2 O3 Ga2 O3 (Gd2 O3) In0.20 Ga0.80 AsGaAs heterostructuresjournal article10.1116/1.28847392-s2.0-44649152192https://www.scopus.com/inward/record.uri?eid=2-s2.0-44649152192&doi=10.1116%2f1.2884739&partnerID=40&md5=e85ff5c2e3632e14eda22bbd103939b3