An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist

Tseng, L.-Y.L.-Y.TsengLin, Y.-C.Y.-C.LinKuo, C.-C.C.-C.KuoKuo, C.-C.C.-C.KuoUeda, M.M.UedaWEN-CHANG CHEN2021-02-042021-02-042020https://www.scopus.com/inward/record.url?eid=2-s2.0-85093653814&partnerID=40&md5=8fb276dfd72d2955ce975b4e0750fe7bhttps://scholars.lib.ntu.edu.tw/handle/123456789/546517An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresistjournal article10.1016/j.reactfunctpolym.2020.1047602-s2.0-85093653814