Chang, S.J.S.J.ChangLee, W.C.W.C.LeeHwang, J.J.HwangMINGHWEI HONGKwo, J.J.Kwo2019-12-272019-12-272008https://scholars.lib.ntu.edu.tw/handle/123456789/443429Time dependent preferential sputtering in the HfO2 layer on Si(100)journal article10.1016/j.tsf.2007.06.0072-s2.0-37549038602https://www.scopus.com/inward/record.uri?eid=2-s2.0-37549038602&doi=10.1016%2fj.tsf.2007.06.007&partnerID=40&md5=862a1716a6ef41b0fa082bf6c022e726