國立臺灣大學生物產業機電工程學系李英群謝志誠李冠霖Lee, Ying-ChunYing-ChunLeeShieh, Jyh-CherngJyh-CherngShiehLee,Guan-LinLee2006-09-282018-07-102006-09-282018-07-102006-06http://ntur.lib.ntu.edu.tw//handle/246246/2006092712295144521823. 農業機械學刊第15 卷第2 期2006 年6 月. 石英基材之奈米加工技術及其. 在壓印上的應用. 李英群. 1. ，謝志誠. 2. ，李冠霖. 1. 1. 國立台灣大學生物產業機電工程學研究所研究生. 2. 國立台灣大學生物產業機電工程學系教授，本文通訊作者Quartz has the potential to be developed as a device due to its material properties including piezoelectricity, isolation, transparency, high hardness and high thermal stability. The major obstacle to MEMS and NEMS developing techniques on quartz is the machining difficulty and the charging problem resulting from isolation in the e-beam exposure process. This research utilizes the conducting polymer Espacer 300 as a conducting layer to dissipate the charging effect. After E-beam lithography, the quartz mold is fabricated by metal evaporation, lift-off, and a reactive ion etch. Afterwards, the surface of the quartz mold is treated by dodecyltrichlorosilane in toluene. Photo-solidification NIL is accomplished using the surface-treated mold and photo cross-linked polymer mr-L 6000.3Xpe. This research has successfully defined 100nm-width resist features and 200nm-width metal mask. Features of 500nm are resolved on the mode and transferred to the polymer after imprinting. Keywords: Quartz,Mold, E-beamlithography, Nanoimprint, Photo-solidification NIL.application/pdf815352 bytesapplication/pdfzh-TW石英母模電子束微影奈米壓印光固化型奈米壓印journal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/20060927122951445218/1/15-2-3.pdf