Huang, C.-W.C.-W.HuangLiao, C.-H.C.-H.LiaoWu, J.C.S.J.C.S.WuLiu, Y.-C.Y.-C.LiuChang, C.-L.C.-L.ChangWu, C.-H.C.-H.WuAnpo, M.M.AnpoMatsuoka, M.M.MatsuokaTakeuchi, M.M.TakeuchiJEFFREY CHI-SHENG WU2018-09-102018-09-102010http://www.scopus.com/inward/record.url?eid=2-s2.0-77957706940&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/356454Photocatalytic TiO2 thin films were prepared via an electron beam-induced deposition (EBID) method. The effects of post-calcination treatment on the properties of the prepared TiO2 thin films were studied. X-ray diffraction (XRD), scanning electron microscope-energy dispersive spectrometry (SEM-EDS), and UV-V is absorption spectrometry were performed to reveal the crystallinity, surface morphology, chemical composition, and light absorbance of the prepared TiO2 thin films. The photoelectrochemical characteristics of the TiO2 thin films were investigated with a potentiostat. Under UV irradiation, a photocurrent of ̃2.1 mA was observed for the TiO2 thin film with post-calcination at 500 °C. A water-splitting reaction was conducted over the TiO2 thin film with the best photoelectrochemical performance. The yields of hydrogen and oxygen were 59.8 and 30.6 μmole, respectively, after 8 h of reaction under UV irradiation. © 2010 Professor T. Nejat Veziroglu. Published by Elsevier Ltd. All rights reserved.Electron beam-induced deposition; Photocatalytic water-splitting; TiO2 thin film[SDGs]SDG6[SDGs]SDG7Absorbances; Absorption spectrometry; Calcination treatment; Chemical compositions; Crystallinities; Electron beam-induced deposition; Energy dispersive spectrometry; Hydrogen generations; Photo-catalytic; Photocatalytic water splitting; Photoelectrochemical characteristics; Photoelectrochemical performance; Potentiostats; Reaction under; Scanning Electron Microscope; SEM-EDS; TiO; TiO2 thin film; UV irradiation; Water splitting; Absorption spectroscopy; Calcination; Deposition; Electron beams; Electron optics; Electrons; Hydrogen production; Irradiation; Oxygen; Scanning electron microscopy; Spectrometry; Thin films; Vapor deposition; Voltage regulators; X ray diffraction; Film preparationjournal article10.1016/j.ijhydene.2010.08.113