Role of stress in irradiation-then-anneal technique used for improving radiation hardness of metal-insulator-semiconductor devices

Shu, K.K.ShuLiao, C.C.LiaoHwu, J.-G.J.-G.HwuJENN-GWO HWU2018-09-102018-09-101992http://www.scopus.com/inward/record.url?eid=2-s2.0-0012561306&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/296940Role of stress in irradiation-then-anneal technique used for improving radiation hardness of metal-insulator-semiconductor devicesjournal article10.1063/1.107819