Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

Chen, H.L.H.L.ChenChuang, Y.F.Y.F.ChuangLee, C.C.C.C.LeeHsieh, C.I.C.I.HsiehKo, F.H.F.H.KoLON A. WANGHSUEN-LI CHEN2020-06-042020-06-042003https://scholars.lib.ntu.edu.tw/handle/123456789/497270Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applicationsconference paper10.1016/S0167-9317(03)00084-42-s2.0-0038359113https://www.scopus.com/inward/record.uri?eid=2-s2.0-0038359113&doi=10.1016%2fS0167-9317%2803%2900084-4&partnerID=40&md5=5875e0eb2b6a4f1a047e9d38cafd871a