Greatly improved interfacial passivation of in-situ high 庥 dielectric deposition on freshly grown molecule beam epitaxy Ge epitaxial layer on Ge(100)

Chu, R.L.R.L.ChuLiu, Y.C.Y.C.LiuLee, W.C.W.C.LeeLin, T.D.T.D.LinHuang, M.L.M.L.HuangPi, T.W.T.W.PiKwo, J.J.KwoMINGHWEI HONG2019-12-272019-12-272014https://scholars.lib.ntu.edu.tw/handle/123456789/443329Greatly improved interfacial passivation of in-situ high 庥 dielectric deposition on freshly grown molecule beam epitaxy Ge epitaxial layer on Ge(100)journal article10.1063/1.48790222-s2.0-84901417531https://www.scopus.com/inward/record.uri?eid=2-s2.0-84901417531&doi=10.1063%2f1.4879022&partnerID=40&md5=c5770ecc3c1e4d0ff31e27dfc5192f56