Chen, C.-Y.C.-Y.ChenTsai, K.-Y.K.-Y.TsaiShen, Y.-T.Y.-T.ShenLee, Y.-M.Y.-M.LeeLi, J.-H.J.-H.LiShieh, J.J.J.J.ShiehKUEN-YU TSAIJIA-HAN LI2020-01-172020-01-172012https://scholars.lib.ntu.edu.tw/handle/123456789/451467Direct-scatterometry-enabled lithography model calibrationconference paper10.1117/12.9175162-s2.0-84861060205https://www.scopus.com/inward/record.uri?eid=2-s2.0-84861060205&doi=10.1117%2f12.917516&partnerID=40&md5=dad3bb1298a80a2e4d804b3480fabe09