Cheng, Fang-SungFang-SungChengSEN-YEU YANGNian, Shih-ChihShih-ChihNianLON A. WANG2009-03-252018-07-062009-03-252018-07-06200610711023http://ntur.lib.ntu.edu.tw//handle/246246/148223https://www.scopus.com/inward/record.uri?eid=2-s2.0-33746483384&doi=10.1116%2f1.2209991&partnerID=40&md5=33f3212be3523cb3df9e50cb361c294cA gasbag pressure (GBP) mechanism has been developed for patterning submicron patterns onto large concave substrate. The GBP mechanism consists of a pressure gasbag and a vacuum chamber system. It provides gradual contact, uniform pressure, and intact contact for imprinting patterns in the soft mold onto a concave substrate. The patterns on the soft mold can be successfully replicated over an entire photoresist-coated concave substrate. The accuracy of replication has been experimentally evaluated. © 2005 American Vacuum Society.application/pdf301650 bytesapplication/pdfen-USMolds; Nanotechnology; Photoresistors; Pressure distribution; Pressure regulation; Substrates; Gasbag pressure (GBP); Vacuum technologyjournal article10.1116/1.22099912-s2.0-33746483384WOS:000239890000007http://ntur.lib.ntu.edu.tw/bitstream/246246/148223/1/59.pdf