Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch

Liang, Eih-ZheEih-ZheLiangHuang, Chao-JeiChao-JeiHuangLin, Ching-FuhChing-FuhLin2009-03-182018-07-062009-03-182018-07-062006http://ntur.lib.ntu.edu.tw//handle/246246/145964application/pdf427561 bytesapplication/pdfen-USUse of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etchjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/145964/1/77.pdf